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Institut für Festkörperforschung - Streumethoden (IFF-4) (ehemals IFF-ISM) >

Please use this identifier to cite or link to this item: http://hdl.handle.net/2128/1175

Title: Temperature induced differences in the nanostructure of hot-wire deposited silicon-germanium alloys analyzed by anomalous small-angle x-ray scattering
Authors: Goerigk, G.
Williamson, D. L.
Issue Date: 2006
Publisher: AMER INST PHYSICS
Citation: Journal of Applied Physics, 99 (2006), 084309-1 - 084309-8
Description: This version is available at the following Publisher URL: http://jap.aip.org
URI: http://dx.doi.org/10.1063/1.2187088
http://hdl.handle.net/2128/1175
ISSN: 0021-8979
Appears in Collections:Institut für Festkörperforschung - Streumethoden (IFF-4) (ehemals IFF-ISM)

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